Runhua Wang is Associate Professor at the University of Science and Technology Beijing. Her research interests are in the areas of intellectual property (“IP”), innovation policy and management, and law and technology. Her research employs empirical methods, law and economics theories, and comparative analyses. Between 2018 and 2020, Professor Wang was Empirical IP Fellow at Chicago-Kent. Prior to joining Chicago-Kent, she was an invited researcher at the Institute of Intellectual Property in Tokyo, Japan, 2018. From 2016 to 2018, She worked at the University of Illinois College of Law as a Post-Doctoral Research Associate. She was also a Thomas Edison Innovation Fellow (2018–19) sponsored by George Mason University. Professor Wang received her LL.M. and J.S.D. from the University of Illinois College of Law. The primary topics of her articles and books cover the effectiveness and efficiency of IP laws and innovation policies.